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author:

于映 (于映.) [1] | 吴清鑫 (吴清鑫.) [2] | 罗仲梓 (罗仲梓.) [3]

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CQVIP PKU CSCD

Abstract:

氮化硅薄膜具有致密的结构、高强度和良好的耐磨性能,可用于MEMS器件中作为结构部件.本文采用PECVD法制备氮化硅薄膜,对氮化硅薄膜的杨氏模量和硬度进行了测试,并分析了沉积温度、反应气体流量比对薄膜杨氏模量和硬度的影响.应用氮化硅薄膜作为悬梁,制作了射频MEMS开关.

Keyword:

MEMS 射频开关 杨氏模量 氮化硅薄膜

Community:

  • [ 1 ] [于映]福州大学
  • [ 2 ] [吴清鑫]福州大学
  • [ 3 ] [罗仲梓]厦门大学

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Source :

传感技术学报

ISSN: 1004-1699

CN: 32-1322/TN

Year: 2006

Issue: 5

Volume: 19

Page: 1967-1969

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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