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author:

Wang, Yanan (Wang, Yanan.) [1] | Zheng, Yue (Zheng, Yue.) [2] | Gao, Jing (Gao, Jing.) [3] | Jin, Tengyu (Jin, Tengyu.) [4] | Li, Enlong (Li, Enlong.) [5] | Lian, Xu (Lian, Xu.) [6] | Pan, Xuan (Pan, Xuan.) [7] | Han, Cheng (Han, Cheng.) [8] | Chen, Huipeng (Chen, Huipeng.) [9] (Scholars:陈惠鹏) | Chen, Wei (Chen, Wei.) [10]

Indexed by:

SCIE

Abstract:

Two-dimensional (2D) van der Waals heterostructure (vdWH)-based floating gate devices show great potential for next-generation nonvolatile and multilevel data storage memory. However, high program voltage induced substantial energy consumption, which is one of the primary concerns, hinders their applications in low-energy-consumption artificial synapses for neuromorphic computing. In this study, we demonstrate a three-terminal floating gate device based on the vdWH of tin disulfide (SnS2), hexagonal boron nitride (h-BN), and few-layer graphene. The large electron affinity of SnS2 facilitates a significant reduction in the program voltage of the device by lowering the hole-injection barrier across h-BN. Our floating gate device, as a nonvolatile multilevel electronic memory, exhibits large on/off current ratio (similar to 10(5)), good retention (over 10(4) s), and robust endurance (over 1000 cycles). Moreover, it can function as an artificial synapse to emulate basic synaptic functions. Further, low energy consumption down to similar to 7 picojoule (pJ) can be achieved owing to the small program voltage. High linearity (<1) and conductance ratio (similar to 80) in long-term potentiation and depression (LTP/LTD) further contribute to the high pattern recognition accuracy (similar to 90%) in artificial neural network simulation. The proposed device with attentive band engineering can promote the future development of energy-efficient memory and neuromorphic devices.

Keyword:

artificial synapse band engineering three-terminal floating gate memory tin disulfide van der Waals heterostructure

Community:

  • [ 1 ] [Wang, Yanan]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 2 ] [Gao, Jing]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 3 ] [Jin, Tengyu]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 4 ] [Pan, Xuan]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 5 ] [Chen, Wei]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 6 ] [Zheng, Yue]Shenzhen Univ, Inst Microscale Optoelect, Minist Educ,SZU NUS Collaborat Innovat Ctr Optoel, Int Collaborat Lab 2D Mat Optoelect Sci & Technol, Shenzhen, Peoples R China
  • [ 7 ] [Pan, Xuan]Shenzhen Univ, Inst Microscale Optoelect, Minist Educ,SZU NUS Collaborat Innovat Ctr Optoel, Int Collaborat Lab 2D Mat Optoelect Sci & Technol, Shenzhen, Peoples R China
  • [ 8 ] [Han, Cheng]Shenzhen Univ, Inst Microscale Optoelect, Minist Educ,SZU NUS Collaborat Innovat Ctr Optoel, Int Collaborat Lab 2D Mat Optoelect Sci & Technol, Shenzhen, Peoples R China
  • [ 9 ] [Jin, Tengyu]Tianjin Univ, Joint Sch Natl Univ Singapore & Tianjin Univ, Int Campus, Fuzhou, Peoples R China
  • [ 10 ] [Chen, Wei]Tianjin Univ, Joint Sch Natl Univ Singapore & Tianjin Univ, Int Campus, Fuzhou, Peoples R China
  • [ 11 ] [Li, Enlong]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou, Peoples R China
  • [ 12 ] [Chen, Huipeng]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou, Peoples R China
  • [ 13 ] [Lian, Xu]Natl Univ Singapore, Dept Chem, Singapore, Singapore
  • [ 14 ] [Chen, Wei]Natl Univ Singapore, Dept Chem, Singapore, Singapore
  • [ 15 ] [Chen, Wei]Natl Univ Singapore Suzhou Res Inst, Suzhou, Peoples R China

Reprint 's Address:

  • [Chen, Wei]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore

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Source :

INFOMAT

ISSN: 2567-3165

Year: 2021

Issue: 8

Volume: 3

Page: 917-928

2 4 . 7 9 8

JCR@2021

2 2 . 7 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:142

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 70

SCOPUS Cited Count: 71

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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