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author:

Gao, Jing (Gao, Jing.) [1] | Lian, Xu (Lian, Xu.) [2] | Chen, Zhixian (Chen, Zhixian.) [3] | Shi, Shu (Shi, Shu.) [4] | Li, Enlong (Li, Enlong.) [5] | Wang, Yanan (Wang, Yanan.) [6] | Jin, Tengyu (Jin, Tengyu.) [7] | Chen, Huipeng (Chen, Huipeng.) [8] (Scholars:陈惠鹏) | Liu, Lei (Liu, Lei.) [9] | Chen, Jingsheng (Chen, Jingsheng.) [10] | Zhu, Yao (Zhu, Yao.) [11] | Chen, Wei (Chen, Wei.) [12]

Indexed by:

EI SCIE

Abstract:

The "Internet-of-Things"-based information society requires the devices to possess high scaling capability as well as rich functionalities. Hybrid systems coupling 2D semiconductors and functional ferroelectrics are attracting increasing attention as complementary devices to the existing silicon systems due to their outstanding electronic and optoelectronic performances. In this work, interfacial states are introduced on the ferroelectric Hf0.5Zr0.5O2 thin film during the annealing process. Utilizing the synergetic effect of ferroelectric polarization and charge trapping behavior, a multifunctional 2D Fe-FET is demonstrated, exhibiting reliable memory properties, tunable synaptic functions, and reconfigurable photodetection behaviors in one single device. Among them, multiple storage levels are achieved with a long retention time. Flexible plasticity including short-term plasticity (STP)/long-term plasticity (LTP) is emulated successfully, and the excellent emulated synaptic behaviors also contribute to the pattern recognition accuracy of approximate to 81% in artificial neural network simulations. Furthermore, the ferroelectric polarization-dependent optoelectronic response is observed, making it promising for the optoelectronic logic device application. The results pave the way for the fabrication of high-density data process systems with various functions.

Keyword:

(2)-based ferroelectrics artificial synapse ferroelectrics device HfO hybrid 2D neuromorphic computing non-volatile memory

Community:

  • [ 1 ] [Gao, Jing]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 2 ] [Wang, Yanan]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 3 ] [Jin, Tengyu]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 4 ] [Chen, Wei]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
  • [ 5 ] [Lian, Xu]Natl Univ Singapore, Dept Chem, Singapore 117543, Singapore
  • [ 6 ] [Chen, Wei]Natl Univ Singapore, Dept Chem, Singapore 117543, Singapore
  • [ 7 ] [Chen, Zhixian]ASTAR, Inst Microelect, 2 Fusionopolis Way, Singapore 138634, Singapore
  • [ 8 ] [Zhu, Yao]ASTAR, Inst Microelect, 2 Fusionopolis Way, Singapore 138634, Singapore
  • [ 9 ] [Shi, Shu]Natl Univ Singapore, Dept Mat Sci & Amp Engn, Singapore 117575, Singapore
  • [ 10 ] [Chen, Jingsheng]Natl Univ Singapore, Dept Mat Sci & Amp Engn, Singapore 117575, Singapore
  • [ 11 ] [Li, Enlong]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 12 ] [Chen, Huipeng]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 13 ] [Jin, Tengyu]Joint Sch Natl Univ Singapore, Singapore, Singapore
  • [ 14 ] [Chen, Wei]Joint Sch Natl Univ Singapore, Singapore, Singapore
  • [ 15 ] [Jin, Tengyu]Tianjin Univ, Int Campus, Fuzhou 350207, Peoples R China
  • [ 16 ] [Chen, Wei]Tianjin Univ, Int Campus, Fuzhou 350207, Peoples R China
  • [ 17 ] [Liu, Lei]Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Jilin, Peoples R China
  • [ 18 ] [Chen, Wei]Natl Univ Singapore Suzhou Res Inst, 377 Lin Quan St,Suzhou Ind Pk, Suzhou 215123, Peoples R China

Reprint 's Address:

  • [Chen, Wei]Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore;;[Chen, Wei]Natl Univ Singapore, Dept Chem, Singapore 117543, Singapore;;[Chen, Wei]Joint Sch Natl Univ Singapore, Singapore, Singapore;;[Chen, Wei]Tianjin Univ, Int Campus, Fuzhou 350207, Peoples R China;;[Chen, Wei]Natl Univ Singapore Suzhou Res Inst, 377 Lin Quan St,Suzhou Ind Pk, Suzhou 215123, Peoples R China

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Source :

ADVANCED FUNCTIONAL MATERIALS

ISSN: 1616-301X

Year: 2022

Issue: 17

Volume: 32

1 9 . 0

JCR@2022

1 8 . 5 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:91

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 42

SCOPUS Cited Count: 42

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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