Quantum　dot　color　conversion　（QDCC）　is　an　effective　strategy　to　realize　the　full　color　of　new　display　devices　and　improve　the　display　color　gamut，　but　the　poor　environmental　stability　of　QD　limits　its　application　and　development.　Based　on　the　atomic　layer　deposition（ALD）　process　with　self-limiting　surface　reaction　characteristics，　this　paper　explores　the　in⁃situ　growth　of　dense　alumina　encapsulation　film　on　a　quantum-dot　color　conversion　film　（QDCCF）.　This　encapsulation　method　effectively　combines　a　high　light　transmittance　and　high　dense　material　with　a　tightly　bonded　process.　The　simulation　results　show　that　the　light　intensity　of　the　QDCCF　encapsulated　by　alumina　reaches　94.9%　of　that　of　the　unencapsulated　one.　Furthermore，　the　experimental　results　also　show　that　the　light　transmittance　of　the　substrate　with　alumina　encapsulation　is　96.4%　of　the　blank　substrate.　Moreover，　after　working　for　240　h　in　a　high　temperature　and　high　humidity　（85　℃，　85%　RH）　environment，　the　light　conversion　efficiency　of　the　encapsulated　QDCCF　remains　60.8%　of　the　initial，　which　is　63.9%　higher　than　the　unencapsulated　（11.43%）.　The　encapsulation　method　effectively　improves　the　stability　of　QDCCF　while　the　light　intensity　is　not　affected，　which　provides　a　feasible　idea　for　improving　the　stability　of　QDCCF，　and　expands　the　application　of　ALD　process　in　the　field　of　photoelectric　display，　which　has　important　scientific　significance　and　application　prospects.　©　2023　Chines　Academy　of　Sciences.　All　rights　reserved.