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author:

Chen, T. (Chen, T..) [1] | Yu, R. (Yu, R..) [2] | Gao, C. (Gao, C..) [3] | Chen, Z. (Chen, Z..) [4] | Chen, H. (Chen, H..) [5] (Scholars:陈惠鹏) | Guo, T. (Guo, T..) [6] (Scholars:郭太良) | Chen, W. (Chen, W..) [7]

Indexed by:

Scopus CSCD

Abstract:

To build neuromorphic computing networks equivalent to the human brain, single artificial synaptic devices should exhibit low energy consumption down to femtojoules. However, most existing solutions for implementing low-energy synaptic devices based on an Ohmic contact are complex in structure or require specific materials, which hinder the further development of artificial neural networks. In this study, a Schottky-barrier-regulated organic synaptic transistor (SBROST) was reported. The device performance was improved by introducing the Schottky barrier at the contact interface between the source electrode and the semiconductor, thereby considerably reducing the energy consumption of one synaptic event compared with conventional OSTs with an Ohmic contact. The SBROST can not only reduce the device’s operating voltage and current but also possess a simple structure that can be utilized in different organic synaptic devices. Furthermore, high recognition accuracy at low energy consumption can be achieved by the SBROST. After 100 epochs, the SBROST-based handwritten artificial neural network exhibits excellent recognition accuracy (93.53%), which is close to the ideal accuracy (95.62%). The scheme of introducing a Schottky barrier into synaptic transistors offers a new perspective for constructing brain-like neural computing networks. [Figure not available: see fulltext.] © 2023, Science China Press.

Keyword:

artificial neural network high recognition accuracy low energy consumption Schottky barrier synaptic plasticity

Community:

  • [ 1 ] [Chen T.]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou, 350002, China
  • [ 2 ] [Chen T.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 3 ] [Chen T.]Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Fuzhou, 350207, China
  • [ 4 ] [Yu R.]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou, 350002, China
  • [ 5 ] [Yu R.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 6 ] [Gao C.]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou, 350002, China
  • [ 7 ] [Gao C.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 8 ] [Chen Z.]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou, 350002, China
  • [ 9 ] [Chen Z.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 10 ] [Chen H.]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou, 350002, China
  • [ 11 ] [Chen H.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 12 ] [Guo T.]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou, 350002, China
  • [ 13 ] [Guo T.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 14 ] [Chen W.]Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Fuzhou, 350207, China
  • [ 15 ] [Chen W.]Department of Chemistry, National University of Singapore, Singapore, 117543, Singapore
  • [ 16 ] [Chen W.]Department of Physics, National University of Singapore, Singapore, 117543, Singapore

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Source :

Science China Materials

ISSN: 2095-8226

Year: 2023

Issue: 11

Volume: 66

Page: 4453-4463

6 . 8

JCR@2023

6 . 8 0 0

JCR@2023

JCR Journal Grade:1

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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