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author:

Fan, Hui-Chen (Fan, Hui-Chen.) [1] | Wang, Chen (Wang, Chen.) [2] | Ruan, Yu-Jiao (Ruan, Yu-Jiao.) [3] | Shen, Kun-Ching (Shen, Kun-Ching.) [4] | Wu, Wan-Yu (Wu, Wan-Yu.) [5] | Wuu, Dong-Sing (Wuu, Dong-Sing.) [6] | Lai, Feng-Min (Lai, Feng-Min.) [7] | Lien, Shui-Yang (Lien, Shui-Yang.) [8] | Zhu, Wen-Zhang (Zhu, Wen-Zhang.) [9]

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EI

Abstract:

In this article, the tunable Zn-doped Ga2O3 films were obtained by introducing ZnO intercalation during the film deposition using plasma-enhanced atomic layer deposition (PEALD). The effect of the ZnO cycle ratio on the performance of solar-blind photodetectors (PDs) was first analyzed. Compared to the pure Ga2O3, an obviously enhanced performance of Zn-doped Ga2O3 films PDs was observed by the introduction of Zn dopants, especially photocurrent or responsivity, even if the light intensity is low. A high sensitivity of Zn-doped Ga2O3 PD has been achieved with superior photoelectric characteristics for an extremely low dark current of 2.22 × 10-13 A, an ultrahigh light ON/ OFF current ratio of 2.89 × 106, and a satisfactory responsivity of 104 mA/W when the ZnO cycle ratio is 5%. The above excellent results imply that the Zn-doped Ga2O3 PD can be greatly beneficial to the application in deep-ultraviolet (DUV) detection. © 1963-2012 IEEE.

Keyword:

Aluminum Aluminum oxide Atomic layer deposition Dark currents Energy gap Gallium Gallium compounds Heterojunctions II-VI semiconductors Magnetic semiconductors Metallic films Optical films Photodetectors Photonic band gap Photons Semiconducting films Temperature Thin films Threshold voltage Wide band gap semiconductors Zinc oxide

Community:

  • [ 1 ] [Fan, Hui-Chen]Xiamen University of Technology, Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, School of Opto-Electronic and Communication Engineering, Xiamen; 361026, China
  • [ 2 ] [Wang, Chen]Xiamen University of Technology, Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, School of Opto-Electronic and Communication Engineering, Xiamen; 361026, China
  • [ 3 ] [Ruan, Yu-Jiao]Xiamen Institute of Measurement and Testing, National Measurement and Testing Center for Flat Panel Display Industry, Xiamen; 361024, China
  • [ 4 ] [Shen, Kun-Ching]Fuzhou University, College of Physics and Information Engineering, Fuzhou; 350108, China
  • [ 5 ] [Wu, Wan-Yu]National United University, Department of Materials Science and Engineering, Miaoli; 36063, Taiwan
  • [ 6 ] [Wuu, Dong-Sing]National Chi Nan University, Department of Applied Materials and Optoelectronic Engineering, Nantou; 54561, Taiwan
  • [ 7 ] [Lai, Feng-Min]Da-Yeh University, Department of Biomedical Engineering, Changhua; 51591, Taiwan
  • [ 8 ] [Lien, Shui-Yang]Xiamen University of Technology, Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, School of Opto-Electronic and Communication Engineering, Xiamen; 361026, China
  • [ 9 ] [Lien, Shui-Yang]Da-Yeh University, Department of Biomedical Engineering, Changhua; 51591, Taiwan
  • [ 10 ] [Zhu, Wen-Zhang]Xiamen University of Technology, Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, School of Opto-Electronic and Communication Engineering, Xiamen; 361026, China

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Source :

IEEE Transactions on Electron Devices

ISSN: 0018-9383

Year: 2024

Issue: 1

Volume: 71

Page: 664-669

2 . 9 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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