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author:

Zheng Long-Wu (Zheng Long-Wu.) [1] | Hu Li-Qin (Hu Li-Qin.) [2] | Xiao Xiao-Jing (Xiao Xiao-Jing.) [3] | Yang Fan (Yang Fan.) [4] | Lin He (Lin He.) [5] | Guo Tai-Liang (Guo Tai-Liang.) [6] (Scholars:郭太良)

Indexed by:

EI Scopus SCIE CSCD

Abstract:

A novel magnetically controlled Ni-plating method has been developed to improve the field-emission properties of carbon nanotubes (CNTs). The effect of the magnetic field and Ni-electroplating on CNT field-emission properties was investigated, and the results are demonstrated using scanning electron microscopy, J-E and the duration test. After treatment, the turn-on electric field declines from 1.55 to 0.91 V/mu m at an emission current density of 100 mu A/cm(2), and the emission current density increases from 0.011 to 0.34 mA/cm(2) at an electric field of 1.0 V/mu m. Both the brightness and uniformity of the CNT emission performance are improved after treatment.

Keyword:

carbon nanotubes field emission magnetic field Ni-electroplate

Community:

  • [ 1 ] [Zheng Long-Wu]Fuzhou Univ, Inst Optoelect Display Technol, Sch Phys & Informat Engn, Fuzhou 350002, Peoples R China
  • [ 2 ] [Hu Li-Qin]Fuzhou Univ, Inst Optoelect Display Technol, Sch Phys & Informat Engn, Fuzhou 350002, Peoples R China
  • [ 3 ] [Xiao Xiao-Jing]Fuzhou Univ, Inst Optoelect Display Technol, Sch Phys & Informat Engn, Fuzhou 350002, Peoples R China
  • [ 4 ] [Yang Fan]Fuzhou Univ, Inst Optoelect Display Technol, Sch Phys & Informat Engn, Fuzhou 350002, Peoples R China
  • [ 5 ] [Lin He]Fuzhou Univ, Inst Optoelect Display Technol, Sch Phys & Informat Engn, Fuzhou 350002, Peoples R China
  • [ 6 ] [Guo Tai-Liang]Fuzhou Univ, Inst Optoelect Display Technol, Sch Phys & Informat Engn, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • 郭太良

    [Guo Tai-Liang]Fuzhou Univ, Inst Optoelect Display Technol, Sch Phys & Informat Engn, Fuzhou 350002, Peoples R China

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Source :

CHINESE PHYSICS B

ISSN: 1674-1056

CN: 11-5639/O4

Year: 2011

Issue: 12

Volume: 20

1 . 3 7 6

JCR@2011

1 . 5 0 0

JCR@2023

ESI Discipline: PHYSICS;

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 7

SCOPUS Cited Count: 6

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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