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author:

Yang, Huihuang (Yang, Huihuang.) [1] | Chen, Cihai (Chen, Cihai.) [2] | Zhang, Guocheng (Zhang, Guocheng.) [3] | Lan, Shuqiong (Lan, Shuqiong.) [4] | Chen, Huipeng (Chen, Huipeng.) [5] | Guo, Tailiang (Guo, Tailiang.) [6]

Indexed by:

EI

Abstract:

A key step toward commercialization of organic thin-film transistors (OTFTs) is to manufacture large-area OTFT arrays with desired uniform device performance. In this work, for the first time, solution-processed OTFT arrays were fabricated with the assistance of laser ablation. The source-drain electrodes and the whole devices were patterned by precise control of laser intensity and process path. Compared with traditional methods, this approach significantly simplifies the fabrication process of OTFT arrays with high quality and high yield. A careful selection of laser processing parameters is key to obtaining high quality and high performance OTFT arrays. The grazing incidence X-ray diffraction experiments and device performance tests ensured the selection of proper laser ablation intensity. Eventually, the OTFT arrays on silicon wafer and ITO glass exhibited uniform electrical characteristics with the mean mobility of 0.16 and 0.10 cm2V-1s-1, respectively. These results demonstrated that the laser ablation process provides a promising tool to simplify the fabrication of solution-processed OTFT arrays with low cost and high yield, which has great potential in upscaling of high performance OTFT arrays for display and circuits. © 2017 American Chemical Society.

Keyword:

Ablation Chemical sensors Field effect transistors ITO glass Laser ablation Organic lasers Phototransistors Semiconducting organic compounds Silicon wafers Thin film circuits Thin films Thin film transistors X ray diffraction

Community:

  • [ 1 ] [Yang, Huihuang]Institute of Optoelectronic Display, National and Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 2 ] [Chen, Cihai]Institute of Optoelectronic Display, National and Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 3 ] [Zhang, Guocheng]Institute of Optoelectronic Display, National and Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 4 ] [Zhang, Guocheng]College of Information Science and Engineering, Fujian University of Technology, Fuzhou; 350108, China
  • [ 5 ] [Lan, Shuqiong]Institute of Optoelectronic Display, National and Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 6 ] [Chen, Huipeng]Institute of Optoelectronic Display, National and Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 7 ] [Guo, Tailiang]Institute of Optoelectronic Display, National and Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China

Reprint 's Address:

  • [chen, huipeng]institute of optoelectronic display, national and local united engineering lab of flat panel display technology, fuzhou university, fuzhou; 350002, china

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Source :

ACS Applied Materials and Interfaces

ISSN: 1944-8244

Year: 2017

Issue: 4

Volume: 9

Page: 3849-3856

8 . 0 9 7

JCR@2017

8 . 5 0 0

JCR@2023

ESI HC Threshold:306

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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