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author:

Cheng, Shuying (Cheng, Shuying.) [1] (Scholars:程树英) | Huang, Cichang (Huang, Cichang.) [2] | Chen, Yanqing (Chen, Yanqing.) [3] | Chen, Guonan (Chen, Guonan.) [4] (Scholars:陈国南)

Indexed by:

EI Scopus PKU CSCD

Abstract:

Sn0.995S1.005 film is prepared By constant current cathodic electro-deposition under the conditions of pH=2.7, Sn2+/S2O32-=1/5, J=3.0 mA/cm2, t=5 h. The film is characterized with XRD and SEM analysis, and is of polycrystalline with orthorhombic structure with grain size of 200-800 nm. Its direct band gap is estimated to be 1.23 eV from the optical measurement. The film is p-type conductivity with an electrical resistivity of 7.5 Ω·cm measured by the four-probe method.

Keyword:

Electric properties Electrodeposition Grain size and shape Optical properties Semiconducting films Semiconducting tin compounds

Community:

  • [ 1 ] [Cheng, Shuying]Department of Chemistry, Fuzhou University, Fuzhou 350002, China
  • [ 2 ] [Cheng, Shuying]Department of Electronic Science and Applied Physics, Fuzhou University, Fuzhou 350002, China
  • [ 3 ] [Huang, Cichang]Department of Electronic Science and Applied Physics, Fuzhou University, Fuzhou 350002, China
  • [ 4 ] [Chen, Yanqing]Department of Electronic Science and Applied Physics, Fuzhou University, Fuzhou 350002, China
  • [ 5 ] [Chen, Guonan]Department of Chemistry, Fuzhou University, Fuzhou 350002, China

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Source :

Chinese Journal of Semiconductors

ISSN: 0253-4177

Year: 2005

Issue: 6

Volume: 26

Page: 1173-1177

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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