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author:

Zhang, Jiayang (Zhang, Jiayang.) [1] | Sun, Zixuan (Sun, Zixuan.) [2] | Wang, Runsheng (Wang, Runsheng.) [3] | Yu, Zhuoqing (Yu, Zhuoqing.) [4] | Ren, Pengpeng (Ren, Pengpeng.) [5] | Huang, Ru (Huang, Ru.) [6]

Indexed by:

EI Scopus

Abstract:

In this paper, the impact of body bias on hot carrier degradation (HCD) in advanced FinFET devices is experimentally investigated. It is observed that the degradation of Idsat is increasing with body bias for the short-channel core devices, while an opposite tendency is found in the long-channel IO devices. The different dependences are found due to the mechanisms of the single-carrier event (SCE) in short-channel devices but the multi-carrier event (MVE) in long-channel devices. The results are helpful for the physical understanding of HCD in FinFET devices. © 2018 IEEE.

Keyword:

FinFET Hot carriers Manufacture

Community:

  • [ 1 ] [Zhang, Jiayang]Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 2 ] [Sun, Zixuan]College of Physics and Information Engineering, Fuzhou University, Fujian; 350002, China
  • [ 3 ] [Wang, Runsheng]Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 4 ] [Yu, Zhuoqing]Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 5 ] [Ren, Pengpeng]Institute of Microelectronics, Peking University, Beijing; 100871, China
  • [ 6 ] [Huang, Ru]Institute of Microelectronics, Peking University, Beijing; 100871, China

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Year: 2018

Page: 352-354

Language: English

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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