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author:

Zhu, Yangbin (Zhu, Yangbin.) [1] | Liu, Yang (Liu, Yang.) [2] | Hu, Hailong (Hu, Hailong.) [3] (Scholars:胡海龙) | Xu, Zhongwei (Xu, Zhongwei.) [4] (Scholars:徐中炜) | Bai, Jieyu (Bai, Jieyu.) [5] | Yang, Kaiyu (Yang, Kaiyu.) [6] (Scholars:杨开宇) | Guo, Tailiang (Guo, Tailiang.) [7] (Scholars:郭太良) | Li, Fushan (Li, Fushan.) [8] (Scholars:李福山)

Indexed by:

EI SCIE CSCD

Abstract:

Recently, solution-processed quantum dot light-emitting diodes (QLEDs) have emerged as a promising candidate for next-generation lighting and display devices. However, when given a constant voltage or current, the QLEDs need a certain working time to reach their maximum brightness. Such positive aging challenge, dramatically reducing the response speed of the device and causing a luminescence delay, is urgent to be investigated and resolved. In the current work, we introduce a charge-storage layer architecture by inserting copper(I) thiocyanate (CuSCN) between the organic hole-injection layer and hole-transport layer. The extracted holes will be released during the next electrical signal stimulation to increase the efficiency of charge transport. As a result, the response speed of the QLEDs is improved by an order of magnitude. In addition, by inserting an inorganic CuSCN layer, the efficiency, lifetime, and environmental stability of red/green/blue full-color QLEDs are enhanced simultaneously. Moreover, this work provides a generic strategy for the fabrication of fast-response and high-efficiency full-color QLEDs without luminescence delay, which plays a critical role in the practical industrialization of QLEDs.

Keyword:

charge storage layer luminescence delay quantum dot response speed

Community:

  • [ 1 ] [Zhu, Yangbin]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 2 ] [Liu, Yang]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 3 ] [Hu, Hailong]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 4 ] [Xu, Zhongwei]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 5 ] [Bai, Jieyu]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 6 ] [Yang, Kaiyu]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 7 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 8 ] [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 9 ] [Zhu, Yangbin]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Peoples R China
  • [ 10 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Peoples R China
  • [ 11 ] [Li, Fushan]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Peoples R China

Reprint 's Address:

  • 李福山

    [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China;;[Li, Fushan]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Peoples R China

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Source :

SCIENCE CHINA-MATERIALS

ISSN: 2095-8226

CN: 10-1236/TB

Year: 2021

Issue: 4

Volume: 65

Page: 1012-1019

8 . 6 4

JCR@2021

6 . 8 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:142

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 7

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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