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author:

Lin, Jiaming (Lin, Jiaming.) [1] | Ye, Weixi (Ye, Weixi.) [2] | Zhang, Xianghong (Zhang, Xianghong.) [3] | Lian, Qiming (Lian, Qiming.) [4] | Wu, Shengyuan (Wu, Shengyuan.) [5] | Guo, Tailiang (Guo, Tailiang.) [6] (Scholars:郭太良) | Chen, Huipeng (Chen, Huipeng.) [7] (Scholars:陈惠鹏)

Indexed by:

EI Scopus SCIE

Abstract:

Artificial neurons have received extensive attention as an important part of neuromorphic computing. Recently, tremendous efforts have been made on the memristor-based neurons, while the regulation of performance of such neurons and its underlining mechanism has been rarely studied. In this work, we propose an artificial neuron device based on Ag/TaOx/Si, which exhibits good threshold switching characteristics (on-off ratio above 10(5)) along with good device stability and cycling stability. The Leaky Integrate-and-Fire (LIF) neuron model is successfully simulated without additional circuitry, including leaky integrated firing and refractory periods. In addition, the effect of oxygen vacancy concentration on the performance of artificial neurons is investigated, and the results showed that an increase of oxygen vacancies can significantly reduce the threshold voltage of neuron activation, the holding voltage and the probability of refractory period. This work provides a simple and effective strategy for the development of artificial neurons with tunable properties.

Keyword:

Artificial neuron Biology Firing memristor neuron Neurons oxygen vacancy modulation Performance evaluation Silicon Switches Threshold voltage

Community:

  • [ 1 ] [Lin, Jiaming]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 2 ] [Ye, Weixi]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 3 ] [Zhang, Xianghong]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 4 ] [Lian, Qiming]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 5 ] [Wu, Shengyuan]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 6 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 7 ] [Chen, Huipeng]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 8 ] [Lin, Jiaming]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 9 ] [Ye, Weixi]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 10 ] [Zhang, Xianghong]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 11 ] [Lian, Qiming]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 12 ] [Wu, Shengyuan]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 13 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 14 ] [Chen, Huipeng]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China

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Source :

IEEE ELECTRON DEVICE LETTERS

ISSN: 0741-3106

Year: 2022

Issue: 8

Volume: 43

Page: 1231-1234

4 . 9

JCR@2022

4 . 1 0 0

JCR@2023

ESI Discipline: ENGINEERING;

ESI HC Threshold:66

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 18

SCOPUS Cited Count: 18

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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