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author:

Shu, Y. (Shu, Y..) [1] | He, K. (He, K..) [2] | Xiong, R. (Xiong, R..) [3] | Cui, Z. (Cui, Z..) [4] | Yang, X. (Yang, X..) [5] | Xu, C. (Xu, C..) [6] | Zheng, J. (Zheng, J..) [7] | Wen, C. (Wen, C..) [8] | Wu, B. (Wu, B..) [9] | Sa, B. (Sa, B..) [10]

Indexed by:

Scopus

Abstract:

Graphene-based van der Waals (vdW) heterostructures have shown great potential in electronic and optoelectronic nanodevices. Herein, we investigate the electronic property and Schottky barrier of graphene/GeN3 vdW heterostructure by first-principles calculations. It is noted that the electronic natures of graphene and GeN3 monolayers are well preserved in the heterostructure lattice due to the weak vdW interaction. Interestingly, the p-type Schottky contact in graphene/GeN3 heterostructure with a barrier height of 0.21 eV can be effectively tuned by both vertical and horizontal strains. Herein, the carrier concentration in the graphene layer reaches ∼1013 cm−2 level by strain engineering. It is noteworthy that the designed optoelectronic field-effect transistor based on graphene/GeN3 heterostructure exhibits distinguished responsivity of 0.297 AW−1 and impressive external quantum efficiency of 54.5% under illumination based on further non-equilibrium Green's function simulations. Our findings are of utmost significance for the metal–semiconductor vdW contact and corresponding applications in high-performance electronic and optoelectronic devices. © 2022 Elsevier B.V.

Keyword:

Graphene/GeN3 Horizontal strain Schottky barrier van der Waals heterostructure Vertical strain

Community:

  • [ 1 ] [Shu, Y.]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
  • [ 2 ] [He, K.]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
  • [ 3 ] [Xiong, R.]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
  • [ 4 ] [Cui, Z.]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
  • [ 5 ] [Yang, X.]College of Environmental Science and Engineering, Fujian Key Laboratory of Pollution Control & Resource Reuse, Fujian Normal University, Fujian, Fuzhou, 350007, China
  • [ 6 ] [Xu, C.]Xiamen Talentmats New Materials Science & Technology Co., Ltd, Xiamen, 361015, China
  • [ 7 ] [Zheng, J.]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
  • [ 8 ] [Wen, C.]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
  • [ 9 ] [Wu, B.]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
  • [ 10 ] [Sa, B.]Multiscale Computational Materials Facility, Key Laboratory of Eco-materials Advanced Technology, College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China

Reprint 's Address:

  • [Sa, B.]Multiscale Computational Materials Facility, China

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Related Keywords:

Source :

Applied Surface Science

ISSN: 0169-4332

Year: 2022

Volume: 604

6 . 7

JCR@2022

6 . 3 0 0

JCR@2023

ESI HC Threshold:91

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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