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author:

Shu, Yu (Shu, Yu.) [1] | He, Kaijun (He, Kaijun.) [2] | Xiong, Rui (Xiong, Rui.) [3] | Cui, Zhou (Cui, Zhou.) [4] | Yang, Xuhui (Yang, Xuhui.) [5] | Xu, Chao (Xu, Chao.) [6] | Zheng, Jingying (Zheng, Jingying.) [7] | Wen, Cuilian (Wen, Cuilian.) [8] (Scholars:温翠莲) | Wu, Bo (Wu, Bo.) [9] (Scholars:吴波) | Sa, Baisheng (Sa, Baisheng.) [10] (Scholars:萨百晟)

Indexed by:

EI Scopus SCIE

Abstract:

Graphene-based van der Waals (vdW) heterostructures have shown great potential in electronic and optoelectronic nanodevices. Herein, we investigate the electronic property and Schottky barrier of graphene/GeN3 vdW heterostructure by first-principles calculations. It is noted that the electronic natures of graphene and GeN3 monolayers are well preserved in the heterostructure lattice due to the weak vdW interaction. Interestingly, the p-type Schottky contact in graphene/GeN3 heterostructure with a barrier height of 0.21 eV can be effectively tuned by both vertical and horizontal strains. Herein, the carrier concentration in the graphene layer reaches similar to 10(13) cm(-2) level by strain engineering. It is noteworthy that the designed optoelectronic field-effect transistor based on graphene/GeN3 heterostructure exhibits distinguished responsivity of 0.297 AW(-1) and impressive external quantum efficiency of 54.5% under illumination based on further non-equilibrium Green's function simulations. Our findings are of utmost significance for the metal-semiconductor vdW contact and corresponding applications in high-performance electronic and optoelectronic devices.

Keyword:

Graphene/GeN3 Horizontal strain Schottky barrier van der Waals heterostructure Vertical strain

Community:

  • [ 1 ] [Shu, Yu]Fuzhou Univ, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 2 ] [He, Kaijun]Fuzhou Univ, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 3 ] [Xiong, Rui]Fuzhou Univ, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 4 ] [Cui, Zhou]Fuzhou Univ, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 5 ] [Zheng, Jingying]Fuzhou Univ, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 6 ] [Wen, Cuilian]Fuzhou Univ, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 7 ] [Wu, Bo]Fuzhou Univ, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 8 ] [Sa, Baisheng]Fuzhou Univ, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 9 ] [Shu, Yu]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 10 ] [He, Kaijun]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 11 ] [Xiong, Rui]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 12 ] [Cui, Zhou]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 13 ] [Zheng, Jingying]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 14 ] [Wen, Cuilian]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 15 ] [Wu, Bo]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 16 ] [Sa, Baisheng]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 17 ] [Yang, Xuhui]Fujian Normal Univ, Coll Environm Sci & Engn, Fujian Key Lab Pollut Control & Resource Reuse, Fuzhou 350007, Fujian, Peoples R China
  • [ 18 ] [Xu, Chao]Xiamen Talentmats New Mat Sci & Technol Co Ltd, Xiamen 361015, Peoples R China

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Source :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

Year: 2022

Volume: 604

6 . 7

JCR@2022

6 . 3 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:91

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 18

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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