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author:

Pan, Y. (Pan, Y..) [1] | Hu, H. (Hu, H..) [2] (Scholars:胡海龙) | Yang, K. (Yang, K..) [3] (Scholars:杨开宇) | Chen, W. (Chen, W..) [4] (Scholars:陈伟) | Lin, L. (Lin, L..) [5] (Scholars:林丽华) | Guo, T. (Guo, T..) [6] (Scholars:郭太良) | Li, F. (Li, F..) [7] (Scholars:李福山)

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Scopus

Abstract:

Photosensitive quantum dot light-emitting diodes (PSQLEDs) possess the dual capabilities of generating and detecting light signals, which is of significant importance for the development of miniaturized and integrated optoelectronic devices. However, the state-of-the-art PSQLEDs can only detect light signals within a certain wavelength range, and require switching between the two functions under different bias voltage directions. In this work, The use of a ZnO/quantum dots (QDs)/ZnO multilayer (ZQZ ML) architecture as both the electron transport layer and the photosensitive layer is pioneered. The QDs in this structure are composed of narrow-bandgap lead sulfide QDs and wide-bandgap cadmium selenide QDs, successfully realizing a unique PSQLED device with C photosensitive characteristics. As a result, the as-fabricated device can respond to illumination from 365 to 1300 nm, and the device achieves a photoresponse rate of 20.9 mA W−1 in self-powered mode to UV light. After UV light irradiation, the maximum external quantum efficiency and maximum luminance of device reached 11.8% and 64,549 cd m−2, respectively. The device shows a record-high luminance ON/OFF ratio of 5500%, which is beneficial for high contrast and accurate information display. © 2024 Wiley-VCH GmbH.

Keyword:

broad-spectrum detection dual-functional light-emitting device photosensitive quantum dot

Community:

  • [ 1 ] [Pan Y.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 2 ] [Hu H.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 3 ] [Hu H.]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China
  • [ 4 ] [Yang K.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 5 ] [Chen W.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 6 ] [Lin L.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 7 ] [Lin L.]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China
  • [ 8 ] [Guo T.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 9 ] [Guo T.]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China
  • [ 10 ] [Li F.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350116, China
  • [ 11 ] [Li F.]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China

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Source :

Advanced Optical Materials

ISSN: 2195-1071

Year: 2024

Issue: 26

Volume: 12

8 . 0 0 0

JCR@2023

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ESI Highly Cited Papers on the List: 0 Unfold All

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30 Days PV: 0

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