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author:

Su, Hao (Su, Hao.) [1] | Qiu, Jiawen (Qiu, Jiawen.) [2] | Li, Junlong (Li, Junlong.) [3] | Chen, Rong (Chen, Rong.) [4] | Le, Jianbi (Le, Jianbi.) [5] | Lei, Xiaoyang (Lei, Xiaoyang.) [6] | Zhang, Yongai (Zhang, Yongai.) [7] (Scholars:张永爱) | Zhou, Xiongtu (Zhou, Xiongtu.) [8] (Scholars:周雄图) | Guo, Tailiang (Guo, Tailiang.) [9] (Scholars:郭太良) | Wu, Chaoxing (Wu, Chaoxing.) [10] (Scholars:吴朝兴)

Indexed by:

EI Scopus SCIE

Abstract:

Non-destructive and accurate inspection of gallium nitride light-emitting diode (GaN-LED) epitaxial wafers is important to GaN-LED technology. However, the conventional electroluminescence inspection, the photoluminescence inspection, and the automated optical inspection cannot fulfill the complex technical requirements. In this work, an inspection method and an operation system based on soft single-contact operation, namely, single-contact electroluminescence (SC-EL) inspection, are proposed. The key component of the SC-EL inspection system is a soft conductive probe with an optical fiber inside, and an AC voltage (70Vpp , pp , 100 kHz) is applied between the probe and the ITO electrode under the LED epitaxial wafer. The proposed SC-EL inspection can measure both the electrical and optical parameters of the LED epitaxial wafer at the same time, while not causing mechanical damage to the LED epitaxial wafer. Moreover, it is demonstrated that the SC-EL inspection has a higher electroluminescence wavelength accuracy than photoluminescence inspection. The results show that the non-uniformity of SC-EL inspection is 444.64%, which is much lower than that of photoluminescence inspection. In addition, the obtained electrical parameters from SC-EL can reflect the reverse leakage current (Is) s ) level of the LED epitaxial wafer. The proposed SC-EL inspection can ensure high inspection accuracy without causing damage to the LED epitaxial wafer, which holds promising application in LED technology. (c) 2024 Chinese Laser Press

Keyword:

Community:

  • [ 1 ] [Su, Hao]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350000, Peoples R China
  • [ 2 ] [Qiu, Jiawen]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350000, Peoples R China
  • [ 3 ] [Li, Junlong]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350000, Peoples R China
  • [ 4 ] [Zhang, Yongai]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350000, Peoples R China
  • [ 5 ] [Zhou, Xiongtu]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350000, Peoples R China
  • [ 6 ] [Guo, Tailiang]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350000, Peoples R China
  • [ 7 ] [Wu, Chaoxing]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350000, Peoples R China
  • [ 8 ] [Chen, Rong]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 9 ] [Le, Jianbi]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 10 ] [Zhang, Yongai]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 11 ] [Zhou, Xiongtu]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 12 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 13 ] [Wu, Chaoxing]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 14 ] [Lei, Xiaoyang]Fujian Inspect & Res Inst Prod Qual, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • [Wu, Chaoxing]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350000, Peoples R China;;[Wu, Chaoxing]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China;;

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Source :

PHOTONICS RESEARCH

ISSN: 2327-9125

Year: 2024

Issue: 8

Volume: 12

Page: 1776-1784

6 . 6 0 0

JCR@2023

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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