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author:

Chen, Chao (Chen, Chao.) [1] | Su, Wenjuan (Su, Wenjuan.) [2] | Lin, Juncheng (Lin, Juncheng.) [3] | Fan, Huichen (Fan, Huichen.) [4] | Lin, Yibin (Lin, Yibin.) [5] | Ye, Jinyu (Ye, Jinyu.) [6] | Zhou, Xiongtu (Zhou, Xiongtu.) [7] (Scholars:周雄图) | Guo, Tailiang (Guo, Tailiang.) [8] (Scholars:郭太良) | Wu, Chaoxing (Wu, Chaoxing.) [9] | Zhang, Yongai (Zhang, Yongai.) [10] (Scholars:张永爱)

Indexed by:

EI Scopus SCIE

Abstract:

This study presents a metal-semiconductor-metal (MSM) and micro-light-emitting diode (mu LED) integrated device (MSM-mu LED) without additional epitaxial growth, which demonstrates excellent performance in ultraviolet (UV) detection and optoelectronic modulation. By employing an approach that combines vertical and lateral integration, the rapid response characteristic of the MSM is utilized to control the current required to activate the mu LED, thereby enhancing the LED's luminous efficiency. The MSM-mu LED device was simulated using Silvaco TCAD software, by optimizing the device structure parameters, such as doping concentration, material thickness, and electrode length, and adjusting the wavelength and intensity of ultraviolet light, the photocurrent value was enhanced to be approximately 6 orders of magnitude higher than the dark current, successfully achieving microampere-level currents to illuminate the mu LED. Under irradiation at 365 nm wavelength, the device exhibited maximum photocurrent. Experimental validation confirmed that MSM-mu LED exhibited significant photocurrent enhancement under UV illumination, indicating its promising potential for high-performance applications in environmental monitoring, high-speed optical communication, and biomedical imaging.

Keyword:

GaN homogeneous integration micro LED MSM-mu LED UV

Community:

  • [ 1 ] [Chen, Chao]Fuzhou Univ, Coll Adv Mfg, Quanzhou 362251, Peoples R China
  • [ 2 ] [Lin, Juncheng]Fuzhou Univ, Coll Adv Mfg, Quanzhou 362251, Peoples R China
  • [ 3 ] [Su, Wenjuan]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 4 ] [Fan, Huichen]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 5 ] [Ye, Jinyu]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 6 ] [Zhou, Xiongtu]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 7 ] [Guo, Tailiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 8 ] [Wu, Chaoxing]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 9 ] [Zhang, Yongai]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 10 ] [Lin, Yibin]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 11 ] [Zhou, Xiongtu]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 12 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 13 ] [Wu, Chaoxing]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 14 ] [Zhang, Yongai]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China

Reprint 's Address:

  • [Zhou, Xiongtu]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China;;[Wu, Chaoxing]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China;;[Zhang, Yongai]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China;;[Zhou, Xiongtu]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China;;[Wu, Chaoxing]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China;;[Zhang, Yongai]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China;;

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Source :

ACS APPLIED ELECTRONIC MATERIALS

Year: 2025

Issue: 1

Volume: 7

Page: 552-559

4 . 4 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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