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author:

Zheng, Z. (Zheng, Z..) [1] | Lu, Y. (Lu, Y..) [2] | Zhuang, J. (Zhuang, J..) [3] | Jia, L. (Jia, L..) [4] | Zhu, S. (Zhu, S..) [5] | Chen, D. (Chen, D..) [6] | Qi, H. (Qi, H..) [7] | Li, T. (Li, T..) [8] (Scholars:李悌涛) | Zhang, H. (Zhang, H..) [9] (Scholars:张海忠) | Lu, X. (Lu, X..) [10] (Scholars:卢孝强)

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Abstract:

Ga2O3-based solar-blind photodetectors (SBPDs) with typical Schottky structure usually exhibit low responsivity and rapid saturation as reverse bias increase in the lack of avalanche gain. In this study, large-area photosensitive Ga2O3 single-crystalline films were homoepitaxially grown by MOCVD, enabling the fabrication of high-performance SBPDs. At a low bias of -5 V, the device exhibits an ultrahigh photoresponsivity of 27.5 A/W and a photo-to-dark current ratio of 2.4 × 105 with an ultralow dark current of 3.74 × 10-8 A/cm2, superior to most similar Ga2O3 SBPDs reported to date. Furthermore, without sacrificing the response speed (tr = 100 ns, td = 240.5 μs), the device attained a peak external quantum efficiency of 1.5 × 104%. This stems from the ultrahigh photoconductive-like gain caused by significant mobility differences of photogenerated carriers under reverse bias in high-quality Ga2O3 homo-epilayer.  © 2024 IEEE.

Keyword:

Ga2O3 high gain homoepitaxy SBPD Schottky photodiode

Community:

  • [ 1 ] [Zheng Z.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350116, China
  • [ 2 ] [Lu Y.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350116, China
  • [ 3 ] [Zhuang J.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350116, China
  • [ 4 ] [Jia L.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350116, China
  • [ 5 ] [Zhu S.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350116, China
  • [ 6 ] [Chen D.]Chinese Academy of Sciences, Research Center of Laser Crystal, Shanghai Institute of Optics and Fine Mechanics, Shanghai, 201800, China
  • [ 7 ] [Qi H.]Chinese Academy of Sciences, Research Center of Laser Crystal, Shanghai Institute of Optics and Fine Mechanics, Shanghai, 201800, China
  • [ 8 ] [Li T.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350116, China
  • [ 9 ] [Zhang H.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350116, China
  • [ 10 ] [Lu X.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350116, China

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Source :

IEEE Electron Device Letters

ISSN: 0741-3106

Year: 2024

Issue: 2

Volume: 46

Page: 143-146

4 . 1 0 0

JCR@2023

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ESI Highly Cited Papers on the List: 0 Unfold All

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30 Days PV: 0

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