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author:

Zheng, Zhenjie (Zheng, Zhenjie.) [1] | Lu, Yaoping (Lu, Yaoping.) [2] | Zhuang, Jiachang (Zhuang, Jiachang.) [3] | Jia, Lemin (Jia, Lemin.) [4] | Zhu, Shoudong (Zhu, Shoudong.) [5] | Chen, Duanyang (Chen, Duanyang.) [6] | Qi, Hongji (Qi, Hongji.) [7] | Li, Titao (Li, Titao.) [8] | Zhang, Haizhong (Zhang, Haizhong.) [9] | Lu, Xiaoqiang (Lu, Xiaoqiang.) [10]

Indexed by:

EI Scopus SCIE

Abstract:

Ga2O3 -based solar-blind photodetectors (SBPDs) with typical Schottky structure usually exhibit low responsivity and rapid saturation as reverse bias increase in the lack of avalanche gain. In this study, large-area photosensitive Ga2O3 single-crystalline films were homoepitaxially grown by MOCVD, enabling the fabrication of high-performance SBPDs. At a low bias of -5 V, the device exhibits an ultrahigh photoresponsivity of 27.5 A/W and a photo-to-dark current ratio of 2.4 x 10(5) with an ultralow dark current of 3.74 x 10(-8) A/cm (2) , superior to most similar Ga2O3 SBPDs reported to date. Furthermore, without sacrificing the response speed (t(r) = 100 ns, t(d) = 240.5 mu s), the device attained a peak external quantum efficiency of 1.5 x 10 (4) %. This stems from the ultrahigh photoconductive-like gain caused by significant mobility differences of photogenerated carriers under reverse bias in high-quality Ga2O3 homo-epilayer.

Keyword:

Dark current Ga2O3 Gallium high gain homoepitaxy MOCVD Performance evaluation Photoconductivity Photodiodes Photonic band gap SBPD Schottky barriers Schottky photodiode Substrates X-ray scattering

Community:

  • [ 1 ] [Zheng, Zhenjie]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 2 ] [Lu, Yaoping]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 3 ] [Zhuang, Jiachang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 4 ] [Jia, Lemin]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 5 ] [Zhu, Shoudong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 6 ] [Li, Titao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 7 ] [Zhang, Haizhong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 8 ] [Lu, Xiaoqiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 9 ] [Chen, Duanyang]Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Res Ctr Laser Crystal, Shanghai 201800, Peoples R China
  • [ 10 ] [Qi, Hongji]Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Res Ctr Laser Crystal, Shanghai 201800, Peoples R China

Reprint 's Address:

  • [Jia, Lemin]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China;;[Li, Titao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China

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Source :

IEEE ELECTRON DEVICE LETTERS

ISSN: 0741-3106

Year: 2025

Issue: 2

Volume: 46

Page: 143-146

4 . 1 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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