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author:

Chen, Qiang (Chen, Qiang.) [1] | Feng, Jiabing (Feng, Jiabing.) [2] | Xue, Yijiao (Xue, Yijiao.) [3] | Huo, Siqi (Huo, Siqi.) [4] | Dinh, Toan (Dinh, Toan.) [5] | Xu, Hang (Xu, Hang.) [6] | Shi, Yongqian (Shi, Yongqian.) [7] | Gao, Jiefeng (Gao, Jiefeng.) [8] | Tang, Long-Cheng (Tang, Long-Cheng.) [9] | Huang, Guobo (Huang, Guobo.) [10] | Lei, Weiwei (Lei, Weiwei.) [11] | Song, Pingan (Song, Pingan.) [12]

Indexed by:

EI Scopus SCIE

Abstract:

To adapt to the trend of increasing miniaturization and high integration of microelectronic equipments, there is a high demand for multifunctional thermally conductive (TC) polymeric films combining excellent flame retardancy and low dielectric constant (epsilon). To date, there have been few successes that achieve such a performance portfolio in polymer films due to their different and even mutually exclusive governing mechanisms. Herein, we propose a trinity strategy for creating a rationally engineered heterostructure nanoadditive (FG@CuP@ZTC) by in situ self-assembly immobilization of copper-phenyl phosphonate (CuP) and zinc-3, 5-diamino-1,2,4-triazole complex (ZTC) onto the fluorinated graphene (FG) surface. Benefiting from the synergistic effects of FG, CuP, and ZTC and the bionic lay-by-lay (LBL) strategy, the as-fabricated waterborne polyurethane (WPU) nanocomposite film with 30 wt% FG@CuP@ZTC exhibits a 55.6% improvement in limiting oxygen index (LOI), 66.0% and 40.5% reductions in peak heat release rate and total heat release, respectively, and 93.3% increase in tensile strength relative to pure WPU film due to the synergistic effects between FG, CuP, and ZTC. Moreover, the WPU nanocomposite film presents a high thermal conductivity (lambda) of 12.7 W m-1 K-1 and a low epsilon of 2.92 at 106 Hz. This work provides a commercially viable rational design strategy to develop high-performance multifunctional polymer nanocomposite films, which hold great potential as advanced polymeric thermal dissipators for high-power-density microelectronics.

Keyword:

Bionic strategy Dielectric constant Flame retardancy Fluorinated graphene Thermal conductivity

Community:

  • [ 1 ] [Chen, Qiang]Hohai Univ, Coll Environm, Key Lab Integrated Regulat & Resource Dev Shallow, Minist Educ, Nanjing 210098, Peoples R China
  • [ 2 ] [Xu, Hang]Hohai Univ, Coll Environm, Key Lab Integrated Regulat & Resource Dev Shallow, Minist Educ, Nanjing 210098, Peoples R China
  • [ 3 ] [Xu, Hang]Hohai Univ, Suzhou Res Inst, Suzhou 215100, Peoples R China
  • [ 4 ] [Feng, Jiabing]Jiaxing Univ, Coll Biol Chem Sci & Engn, Jiaxing 314001, Peoples R China
  • [ 5 ] [Xue, Yijiao]Chinese Acad Forestry CAF, Inst Chem Ind Forest Prod, Nanjing 210042, Peoples R China
  • [ 6 ] [Huo, Siqi]Univ Southern Queensland, Ctr Future Mat, Sch Engn, Springfield 4300, Australia
  • [ 7 ] [Dinh, Toan]Univ Southern Queensland, Ctr Future Mat, Sch Engn, Springfield 4300, Australia
  • [ 8 ] [Shi, Yongqian]Fuzhou Univ, Coll Environm & Safety Engn, Fuzhou 350116, Peoples R China
  • [ 9 ] [Gao, Jiefeng]Yangzhou Univ, Sch Chem & Chem Engn, Yangzhou 225002, Peoples R China
  • [ 10 ] [Tang, Long-Cheng]Hangzhou Normal Univ, Coll Mat, Key Lab Organosilicon Chem & Mat Technol MoE, Chem & Chem Engn, Hangzhou 311121, Peoples R China
  • [ 11 ] [Huang, Guobo]Taizhou Univ, Sch Pharmaceut & Chem Engn, Jiaojiang 318000, Peoples R China
  • [ 12 ] [Lei, Weiwei]RMIT Univ, Sch Sci, Melbourne, Vic 3000, Australia
  • [ 13 ] [Song, Pingan]Univ Southern Queensland, Ctr Future Mat, Sch Agr & Environm Sci, Springfield, Qld 4300, Australia

Reprint 's Address:

  • [Xu, Hang]Hohai Univ, Coll Environm, Key Lab Integrated Regulat & Resource Dev Shallow, Minist Educ, Nanjing 210098, Peoples R China;;[Xu, Hang]Hohai Univ, Suzhou Res Inst, Suzhou 215100, Peoples R China;;[Huang, Guobo]Taizhou Univ, Sch Pharmaceut & Chem Engn, Jiaojiang 318000, Peoples R China;;[Song, Pingan]Univ Southern Queensland, Ctr Future Mat, Sch Agr & Environm Sci, Springfield, Qld 4300, Australia

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Source :

NANO-MICRO LETTERS

ISSN: 2311-6706

Year: 2025

Issue: 1

Volume: 17

3 1 . 6 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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