The　fabrication　of　patterned　quantum　dot　(QD)　films　is　of　great　importance　for　color　displays　based　on　photo-emissive　color　conversion.　In　this　work,　a　novel　and　precise　alignment-free　fabrication　method　of　patterned　quantum　dot　color　conversion　(QDCC)　films　was　proposed　by　introducing　into　aspiration-assisted　lithography.　QDs　dispersed　in　mixed　polymer/toluene　solvent　can　be　imbibed　via　predetermined　micro-channels　with　the　assist　of　aspiration.　The　results　show　that　uniform　QDCC　films　with　multicolor　QDs　could　be　achieved　by　adjusting　the　polymer/toluene　ratios　and　the　aspiration　time.　Superfine　QD　patterns　with　a　width　of　around　8　mu　m　could　also　be　obtained　by　varying　the　interfacial　free　energies　of　substrates.　A　color　conversion　device　using　a　turquoise　OLED　and　the　QDCC　films　incorporated　with　distributed　Bragg　reflector　have　been　demonstrated,　exhibiting　a　conversion　efficiency　up　to　23.27%.