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author:

Du, Zaifa (Du, Zaifa.) [1] | Li, Dianlun (Li, Dianlun.) [2] | Guo, Weiling (Guo, Weiling.) [3] | Xiong, Fangzhu (Xiong, Fangzhu.) [4] | Tang, Penghao (Tang, Penghao.) [5] | Zhou, Xiongtu (Zhou, Xiongtu.) [6] (Scholars:周雄图) | Zhang, Yongai (Zhang, Yongai.) [7] (Scholars:张永爱) | Guo, Tailiang (Guo, Tailiang.) [8] (Scholars:郭太良) | Yan, Qun (Yan, Qun.) [9] | Sun, Jie (Sun, Jie.) [10] (Scholars:孙捷)

Indexed by:

EI SCIE

Abstract:

The quantum dot (QD) color-conversion efficiency (CCE) in GaN micro-light-emitting diodes (mu LEDs) is greatly improved by non-radiative energy transfer (NRET) mechanism. An array of deep nano-holes with a diameter of about 1 mu m was fabricated in mu LED mesas (40 x 60 mu m(2)) by nanoimprint lithography. The nano-holes were etched straight through the mu LED active region to ensure that the filled QDs were in extremely close contact with the active region. The absorption efficiency and emission efficiency of QDs are effectively improved by NRET, resulting in a super-high CCE in QD-mu LED hybrid devices. Compared to mu LED devices with conventional spin-coated QDs, the CCE of novel nano-hole mu LEDs with filled QDs has been enhanced by about 118%.

Keyword:

color-conversion efficiency mu LED non-radiative energy transfer

Community:

  • [ 1 ] [Du, Zaifa]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Guo, Weiling]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Xiong, Fangzhu]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Tang, Penghao]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Li, Dianlun]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 6 ] [Zhou, Xiongtu]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 7 ] [Zhang, Yongai]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 8 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 9 ] [Yan, Qun]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 10 ] [Sun, Jie]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 11 ] [Li, Dianlun]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 12 ] [Zhou, Xiongtu]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 13 ] [Zhang, Yongai]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 14 ] [Guo, Tailiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 15 ] [Yan, Qun]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 16 ] [Sun, Jie]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China

Reprint 's Address:

  • 孙捷

    [Sun, Jie]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China

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Source :

IEEE ELECTRON DEVICE LETTERS

ISSN: 0741-3106

Year: 2021

Issue: 8

Volume: 42

Page: 1184-1187

4 . 8 1 6

JCR@2021

4 . 1 0 0

JCR@2023

ESI Discipline: ENGINEERING;

ESI HC Threshold:105

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 10

SCOPUS Cited Count: 9

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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