We　present　a　ligand-exchange-free　photo-patternable　quantum-dot　photoresist　(QDPR)　with　high　photolithographic　uniformity.　The　dispersion　mechanism　between　the　QD＇s　surface　ligands　and　the　functional　groups　of　photoresist　polymers　are　studied.　Results　show　that　the　dispersibility　and　photoluminescent　intensity　of　this　QDPR　can　be　both　improved　by　controlling　dispersant　and　antioxidant.　For　device　demonstration,　multi-colored　quantum　dot　color　conversion　films　(QDCCF)　were　prepared　and　patterned　by　a　photolithography　process.　High　QD　dispersibility　and　film-forming　uniformity　were　both　achieved　with　this　QDCCF.　It　is　believed　that　the　proposed　QDPR　has　the　potential　to　be　extensively　used　in　lighting　or　display　applications.