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author:

Zhang, Guocheng (Zhang, Guocheng.) [1] | Ma, Chao (Ma, Chao.) [2] | Wu, Xiaomin (Wu, Xiaomin.) [3] | Zhang, Xianghong (Zhang, Xianghong.) [4] | Gao, Changsong (Gao, Changsong.) [5] | Chen, Huipeng (Chen, Huipeng.) [6] (Scholars:陈惠鹏) | Guo, Tailiang (Guo, Tailiang.) [7] (Scholars:郭太良)

Indexed by:

EI SCIE

Abstract:

In order to comply with the rapid development of new-generation electronics, developing memories which could meet the demands for specific application such as flexibility, transparency and neuromorphic functions are of great significance. In this work, a transparent organic nonvolatile memory (transparency >= 81%) is developed with Ag nanowire as floating gate layer, which exhibits excellent memory characteristics and mechanical flexibility. Moreover, the transition from memory to artificial synapse is achieved by adjusting the concentration of Ag nanowire. This work provides a new solution for transparent flexible memory and shows their potential for next-generation transparent organic electronics.

Keyword:

Bending floating gate Next generation networking Nonvolatile memory Organic transparent memory Photonic band gap Substrates Synapses synaptic transistor Transistors

Community:

  • [ 1 ] [Zhang, Guocheng]Fujian Univ Technol, Res Ctr Microelect Technol, Fuzhou 350108, Peoples R China
  • [ 2 ] [Ma, Chao]Fujian Univ Technol, Res Ctr Microelect Technol, Fuzhou 350108, Peoples R China
  • [ 3 ] [Wu, Xiaomin]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 4 ] [Zhang, Xianghong]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 5 ] [Gao, Changsong]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 6 ] [Chen, Huipeng]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 7 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 8 ] [Wu, Xiaomin]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 9 ] [Zhang, Xianghong]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 10 ] [Gao, Changsong]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 11 ] [Chen, Huipeng]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 12 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China

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Source :

IEEE ELECTRON DEVICE LETTERS

ISSN: 0741-3106

Year: 2022

Issue: 5

Volume: 43

Page: 733-736

4 . 9

JCR@2022

4 . 1 0 0

JCR@2023

ESI Discipline: ENGINEERING;

ESI HC Threshold:66

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 16

SCOPUS Cited Count: 16

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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