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author:

Li, Wenhao (Li, Wenhao.) [1] | Wang, Kun (Wang, Kun.) [2] | Liao, Yitao (Liao, Yitao.) [3] | Guo, Jiawei (Guo, Jiawei.) [4] | Shen, Yiwei (Shen, Yiwei.) [5] | Li, Junlong (Li, Junlong.) [6] | Su, Hao (Su, Hao.) [7] | Zhou, Xiongtu (Zhou, Xiongtu.) [8] (Scholars:周雄图) | Zhang, Yongai (Zhang, Yongai.) [9] (Scholars:张永爱) | Yang, Lan (Yang, Lan.) [10] | Guo, Tailiang (Guo, Tailiang.) [11] (Scholars:郭太良) | Wu, Chaoxing (Wu, Chaoxing.) [12] (Scholars:吴朝兴)

Indexed by:

EI Scopus SCIE

Abstract:

Noncarrier injection (NCI) operation mode is an emerging driving mode for nanoscale light-emitting diodes (LEDs) for application in nanopixel light-emitting displays. However, the luminescence intensity of the NCI-LED with traditional epitaxial structure is relatively low because of the absence of external carrier injection. Therefore, improving the luminescence intensity by optimizing the epitaxial structure of the LED is an important technical measure. In this work, the tunneling behavior of the NCI-LED under reverse bias, which plays a key role in increasing the luminescence intensity, is studied through modeling and simulation. The dynamic variation of carrier concentration in each voltage cycle is studied to explore the working process of the NCI-LED. Results show that the luminescence output of the NCI-LED is highly sensitive to doping concentrations, and reducing the number of multiquantum wells can increase the probability of interband tunneling so as to improve dramatically the carrier number contributing to luminescence. This simulation work can deepen the understanding of the NCI mode and serve as an important guidance for the rational design of the NCI-LEDs.

Keyword:

alternating current interband tunneling nanolight-emitting diodes noncarrier injection simulation studies

Community:

  • [ 1 ] [Li, Wenhao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 2 ] [Wang, Kun]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 3 ] [Liao, Yitao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 4 ] [Guo, Jiawei]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 5 ] [Shen, Yiwei]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 6 ] [Li, Junlong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 7 ] [Su, Hao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 8 ] [Zhou, Xiongtu]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 9 ] [Zhang, Yongai]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 10 ] [Guo, Tailiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 11 ] [Wu, Chaoxing]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 12 ] [Zhou, Xiongtu]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 13 ] [Zhang, Yongai]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 14 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 15 ] [Wu, Chaoxing]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 16 ] [Yang, Lan]Jimei Univ, Sch Sci, Xiamen 361021, Peoples R China

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Source :

ADVANCED ELECTRONIC MATERIALS

ISSN: 2199-160X

Year: 2023

Issue: 8

Volume: 9

5 . 3

JCR@2023

5 . 3 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:49

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 8

SCOPUS Cited Count: 9

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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