High-density　light-emitting　diodes　(LEDs)　show　great　potential　for　next-generation　micro-display　technology　due　to　their　high　resolution,　long　operational　life,　high　brightness　and　high　efficiency.　However,　conventional　fabrication　methods　for　high　density　LEDs　suffer　from　issues　such　as　growth　difficulties,　etch　damage,　and　ion　implantation　damage.　In　this　work,　we　propose　an　epitaxial　slice　damage-free　process　to　fabricate　an　LED　array　with　high　density　(2500　pixels　per　inch).　To　inhibit　the　potential　electrical　and　optical　crosstalk,　the　single-contact　(SC)　operation　mode　is　employed.　It　is　demonstrated　that　the　SC-LEDs　show　frequency-selective　luminescence　characteristics.　Moreover,　crosstalk　effect　of　the　LEDs　is　significantly　reduced　compared　to　that　operating　in　conventional　DC　mode.　Finally,　the　mechanism　of　crosstalk　suppression　is　revealed　by　finite　element　analysis.　This　work　provides　a　promising　approach　for　realizing　high　density　LED　array,　offering　valuable　reference　for　further　development　in　micro/nano-display　technology.