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author:

Wang, Dingke (Wang, Dingke.) [1] | Zhuang, Jiaqing (Zhuang, Jiaqing.) [2] | Hou, Wenjun (Hou, Wenjun.) [3] | Yan, Xiaolin (Yan, Xiaolin.) [4] | Hu, Hailong (Hu, Hailong.) [5] (Scholars:胡海龙) | Guo, Tailiang (Guo, Tailiang.) [6] (Scholars:郭太良) | Li, Fushan (Li, Fushan.) [7] (Scholars:李福山)

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EI Scopus SCIE

Abstract:

Quantum dot light-emitting diodes (QLEDs), as an emerging display technology, have garnered widespread attention due to their excellent color rendering, high efficiency, and long lifespan. However, the inherent differences in the properties of charge transport layer materials inevitably lead to charge injection imbalances and low device performance. Herein, we developed a simple technique by using femtosecond laser scanning over the QLED devices. The results indicate that scanning with a femtosecond laser improves the conductivity of the hole transport layer and increases the external quantum efficiency of the QLED devices. Our work provides an effective route for realizing high performance QLED devices with efficient post-treatment. (c) 2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).

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Community:

  • [ 1 ] [Wang, Dingke]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350108, Peoples R China
  • [ 2 ] [Hu, Hailong]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350108, Peoples R China
  • [ 3 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350108, Peoples R China
  • [ 4 ] [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350108, Peoples R China
  • [ 5 ] [Zhuang, Jiaqing]Natl Ctr Technol Innovat Display, Guangzhou 510525, Peoples R China
  • [ 6 ] [Hou, Wenjun]TCL Res, Shenzhen 518057, Peoples R China
  • [ 7 ] [Yan, Xiaolin]TCL Res, Shenzhen 518057, Peoples R China

Reprint 's Address:

  • 李福山

    [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350108, Peoples R China

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AIP ADVANCES

ISSN: 2158-3226

Year: 2024

Issue: 4

Volume: 14

1 . 4 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 7

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