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author:

Ye Yun (Ye Yun.) [1] (Scholars:叶芸) | Chen Tian-Yuan (Chen Tian-Yuan.) [2] | Guo Tai-Liang (Guo Tai-Liang.) [3] (Scholars:郭太良) | Jiang Ya-Dong (Jiang Ya-Dong.) [4]

Indexed by:

EI Scopus SCIE PKU CSCD

Abstract:

The effect of magnetic field assisted heat-treatment on the field emission properties of metalized multi-walled carbon nanotubes (MWNTs) is investigated. The metalized MWNTs are prepared via an electroless plating method, and then the MWNTs/Ni cathodes are fabricated by screen printing. The morphology and composition of MWNTs/Ni were studied by transmission electron microscopy and energy dispersive X-ray detector, and the difference between MWNTs/Ni cathodes heat-treated with or without magnetic field was observed by scanning electron microscopy. The force of a single MWNT coated with Ni was simulated, and the results demonstrate that the magnetic field force could induce the rotation of MWNTs/Ni during magnetic field assisted heat-treatment. The field emission characteristics show that the MWNTs/Ni cathodes heat-treated with magnetic field has a low turn-on field of 0.80 V.mu m (1) and high field enhancement factor of 16068, which are attributed to the embossment of MWNTs/Ni from substrates under the magnetic field.

Keyword:

electroless plating field emission magnetic field metalized multi-walled carbon nanotubes

Community:

  • [ 1 ] [Ye Yun]Fuzhou Univ, Coll Phys & Telecommun Engn, Fuzhou 350002, Peoples R China
  • [ 2 ] [Chen Tian-Yuan]Fuzhou Univ, Coll Phys & Telecommun Engn, Fuzhou 350002, Peoples R China
  • [ 3 ] [Guo Tai-Liang]Fuzhou Univ, Coll Phys & Telecommun Engn, Fuzhou 350002, Peoples R China
  • [ 4 ] [Jiang Ya-Dong]Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China

Reprint 's Address:

  • 郭太良

    [Guo Tai-Liang]Fuzhou Univ, Coll Phys & Telecommun Engn, Fuzhou 350002, Peoples R China

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Source :

ACTA PHYSICA SINICA

ISSN: 1000-3290

CN: 11-1958/O4

Year: 2014

Issue: 8

Volume: 63

0 . 8 1 3

JCR@2014

0 . 8 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:213

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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